Minimizing the Carbon Content of Thin Ruthenium Films by MOCVD Precursor Complex Design and Process Control
A. Schneider, N. Popovska, I. Jipa, B. Atakan, M. A. Siddiqi, R. Siddiqui, U. ZenneckVolume:
13
Year:
2007
Language:
english
Pages:
7
DOI:
10.1002/cvde.200606582
File:
PDF, 502 KB
english, 2007