Growth of HfO2 by Liquid Injection MOCVD and ALD Using New...

Growth of HfO2 by Liquid Injection MOCVD and ALD Using New Hafnium-Cyclopentadienyl Precursors

R. O'Kane, J. Gaskell, A. C. Jones, P. R. Chalker, K. Black, M. Werner, P. Taechakumput, S. Taylor, P. N. Heys, R. Odedra
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Volume:
13
Year:
2007
Language:
english
Pages:
9
DOI:
10.1002/cvde.200706589
File:
PDF, 650 KB
english, 2007
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