Atomic Layer Deposition of NiO by the Ni(thd)2/H2O...

Chemical Vapor Deposition 2009 Vol. 15; Iss. 7-9

Atomic Layer Deposition of NiO by the Ni(thd)2/H2O Precursor Combination

Erik Lindahl, Mikael Ottosson, Jan-Otto Carlsson
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Volume:
15
Year:
2009
Language:
english
Pages:
6
DOI:
10.1002/cvde.200906762
File:
PDF, 580 KB
english, 2009
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