Atomic Layer Deposition of Gadolinium Aluminate using...

Chemical Vapor Deposition 2010 Vol. 16; Iss. 4-6

Atomic Layer Deposition of Gadolinium Aluminate using Gd(iPrCp)3, TMA, and O3 or H2O

Christoph Adelmann, Dieter Pierreux, Johan Swerts, Daan Dewulf, An Hardy, Hilde Tielens, Alexis Franquet, Bert Brijs, Alain Moussa, Thierry Conard, Marlies K. Van Bael, Jan W. Maes, Malgorzata Jurczak
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Volume:
16
Year:
2010
Language:
english
Pages:
9
DOI:
10.1002/cvde.200906833
File:
PDF, 587 KB
english, 2010
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