Modeling the Transport and Reaction Mechanisms of Copper...

Chemical Vapor Deposition 2010 Vol. 16; Iss. 10-12

Modeling the Transport and Reaction Mechanisms of Copper Oxide CVD

David Arana-Chavez, Edward Toumayan, Federico Lora, Christopher McCaslin, Raymond A. Adomaitis
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Volume:
16
Year:
2010
Language:
english
Pages:
10
DOI:
10.1002/cvde.201006873
File:
PDF, 524 KB
english, 2010
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