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Growth of the Initial Atomic Layers of Ta-N Films During Atomic Layer Deposition on Silicon-Based Substrates
Steffen Strehle, Daniela Schmidt, Matthias Albert, Johann W. BarthaVolume:
17
Year:
2011
Language:
english
Pages:
8
DOI:
10.1002/cvde.201006874
File:
PDF, 651 KB
english, 2011