Growth of the Initial Atomic Layers of Ta-N Films During...

Growth of the Initial Atomic Layers of Ta-N Films During Atomic Layer Deposition on Silicon-Based Substrates

Steffen Strehle, Daniela Schmidt, Matthias Albert, Johann W. Bartha
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Volume:
17
Year:
2011
Language:
english
Pages:
8
DOI:
10.1002/cvde.201006874
File:
PDF, 651 KB
english, 2011
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