Conformity of Aluminum Thin Films Deposited onto...

Chemical Vapor Deposition 2011 Vol. 17; Iss. 10-12

Conformity of Aluminum Thin Films Deposited onto Micro-Patterned Silicon Wafers by Pulsed Laser Deposition, Magnetron Sputtering, and CVD

Anne-Lise Thomann, Constantin Vahlas, Lyacine Aloui, Diane Samelor, Amael Caillard, Nurhul Shaharil, Romuald Blanc, Eric Millon
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Volume:
17
Year:
2011
Language:
english
Pages:
9
DOI:
10.1002/cvde.201106936
File:
PDF, 667 KB
english, 2011
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