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Determination of boron in the thin surface layer of a silicon wafer by instrumental charged particle activation analysis
H. Yonezawa, C. Yonezawa, T. ShigematsuVolume:
198
Language:
english
Pages:
10
DOI:
10.1007/bf02038250
Date:
November, 1995
File:
PDF, 400 KB
english, 1995