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Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography
David C. Tully, Kathryn Wilder, Jean M. J. Fréchet, Alexander R. Trimble, Calvin F. QuateVolume:
11
Year:
1999
Language:
english
Pages:
5
DOI:
10.1002/(sici)1521-4095(199903)11:43.0.co;2-e
File:
PDF, 376 KB
english, 1999