Determination of boron range distribution in ion-implanted silicon by the10B(n, α)7Li reaction
Á. Z. Nagy, J. Bogáncs, J. Gyulai, A. Csőke, V. Nazarov, Z. Seres, A. Szabo, Yu. YazvitskyVolume:
38
Year:
1977
Language:
english
Pages:
9
DOI:
10.1007/bf02520179
File:
PDF, 726 KB
english, 1977