A new model for the thermal oxidation kinetics of silicon

A new model for the thermal oxidation kinetics of silicon

Edward H. Nicollian, A. Reisman
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Volume:
17
Language:
english
Pages:
10
DOI:
10.1007/bf02652105
Date:
July, 1988
File:
PDF, 1.04 MB
english, 1988
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