Low-temperature processing of shallow junctions using...

Journal of Electronic Materials 1995 / 07 Vol. 24; Iss. 7

Low-temperature processing of shallow junctions using epitaxial and polycrystalline CoSi2

Erin C. Jones, Nathan W. Cheung, David B. Fraser
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Volume:
24
Language:
english
Pages:
11
DOI:
10.1007/bf02653335
Date:
July, 1995
File:
PDF, 1.89 MB
english, 1995
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