Selective chemical etching of polycrystalline SiGe alloys...

Journal of Electronic Materials 1992 / 08 Vol. 21; Iss. 8

Selective chemical etching of polycrystalline SiGe alloys with respect to Si and SiO2

F. Scott Johnson, Donald S. Miles, Douglas T. Grider, J. J. Wortman
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Volume:
21
Language:
english
Pages:
6
DOI:
10.1007/bf02665519
Date:
August, 1992
File:
PDF, 622 KB
english, 1992
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