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Preparation of Hf-Si-O films by simultaneous deposition and...

Preparation of Hf-Si-O films by simultaneous deposition and reaction process using pulsed ion-beam evaporation

Tetsuya Nagahama, Tsunetoshi Arikado, Hisayuki Suematsu, Weihua Jiang, Kiyoshi Yatsui
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Volume:
152
Year:
2005
Language:
english
Pages:
6
DOI:
10.1002/eej.20099
File:
PDF, 627 KB
english, 2005
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