Preparation of Hf-Si-O films by simultaneous deposition and reaction process using pulsed ion-beam evaporation
Tetsuya Nagahama, Tsunetoshi Arikado, Hisayuki Suematsu, Weihua Jiang, Kiyoshi YatsuiVolume:
152
Year:
2005
Language:
english
Pages:
6
DOI:
10.1002/eej.20099
File:
PDF, 627 KB
english, 2005