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Ultrapure materials for alpha particle-sensitive applications
John A. Dunlop, Keith E. Ritala, James R. Gibbard, Rod Beauprie, Benoit Pouliquen, James H. Reeves, John C. Huneke, Wojciech A. ViethVolume:
41
Language:
english
Pages:
4
DOI:
10.1007/bf03220244
Date:
June, 1989
File:
PDF, 964 KB
english, 1989