Characterization of non-stoichiometric co-sputtered...

Characterization of non-stoichiometric co-sputtered Ba0.6Sr0.4(Ti1 − xFex)1 + xO3 − δthin films for tunable passive microwave applications

F. Stemme, H. Geßwein, M. D. Drahus, B. Holländer, C. Azucena, J. R. Binder, R.-A. Eichel, J. Haußelt, M. Bruns
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Volume:
403
Language:
english
Pages:
8
DOI:
10.1007/s00216-011-5435-z
Date:
May, 2012
File:
PDF, 567 KB
english, 2012
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