Shear thickening of chemical mechanical polishing slurries under high shear
Nathan C. Crawford, S. Kim R. Williams, David Boldridge, Matthew W. LiberatoreVolume:
51
Language:
english
Pages:
11
DOI:
10.1007/s00397-012-0636-8
Date:
July, 2012
File:
PDF, 612 KB
english, 2012