Quantum chemical study of the SiC formation process in plasma enhanced chemical vapor deposition system
Akitomo Tachibana, Susumu Kawauchi, Tasuku Yano, Naoto Yoshida, Tokio YamabeVolume:
313
Year:
1994
Language:
english
Pages:
8
DOI:
10.1016/0166-1280(94)85035-6
File:
PDF, 459 KB
english, 1994