A method for analysis and profiling of boron, carbon and...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 1984 Vol. 4; Iss. 3

A method for analysis and profiling of boron, carbon and oxygen impurities in semiconductor wafers by recoil atoms in heavy ion beams

M. Petrascu, I. Berceanu, I. Brancus, A. Buta, M. Duma, C. Grama, I. Lazar, I. Mihai, M. Petrovici, V. Simion, M. Mihaila, I. Ghita
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
4
Year:
1984
Language:
english
Pages:
3
DOI:
10.1016/0168-583x(84)90585-8
File:
PDF, 296 KB
english, 1984
Conversion to is in progress
Conversion to is failed