Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
1985 Vol. 7-8; Iss. part-P2
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SiO2 layer implanted with N2+ ions as a negative inorganic resist for ion beam lithography
Zbigniew Znamirowski, Janusz MartanVolume:
7-8
Year:
1985
Language:
english
Pages:
3
DOI:
10.1016/0168-583x(85)90495-1
File:
PDF, 357 KB
english, 1985