Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
1985 Vol. 6; Iss. 1-2
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High energy ion implantation for C-MOS isolation n-wells technology: Problems related to the use of multicharged phosphorous ions in an industrial context
P. Spinelli, J. Escaron, A. Soubie, M. BruelVolume:
6
Year:
1985
Language:
english
Pages:
4
DOI:
10.1016/0168-583x(85)90646-9
File:
PDF, 467 KB
english, 1985