The suppression of residual defects in silicon implanted...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 1985 Vol. 9; Iss. 3

The suppression of residual defects in silicon implanted with arsenic by rapid isothermal annealing

C.M. Hasenack, J.P. De Souza, I.J.R. Baumvol
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Volume:
9
Year:
1985
Language:
english
Pages:
3
DOI:
10.1016/0168-583x(85)90761-x
File:
PDF, 341 KB
english, 1985
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