The electronic stopping and range profile calculations for...

The electronic stopping and range profile calculations for high energy implantation of phosphorous into silicon

M. Posselt, W. Skorupa
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Volume:
21
Year:
1987
Language:
english
Pages:
6
DOI:
10.1016/0168-583x(87)90132-7
File:
PDF, 401 KB
english, 1987
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