Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
1987 Vol. 21; Iss. 1-4
![](/img/cover-not-exists.png)
Layer thicknesses in oxygen implantation of silicon
D.H. Douglas-Hamilton, Robert P. Dolan, Helen E. FriedmanVolume:
21
Year:
1987
Language:
english
Pages:
5
DOI:
10.1016/0168-583x(87)90817-2
File:
PDF, 283 KB
english, 1987