Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
1989 Vol. 37-38; Iss. none
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Depth profiles of secondary defects of As+ and BF2+ implanted silicon measured by a thermal wave technique
Katsuya Ishikawa, Masakatsu Yoshida, Mono InoueVolume:
37-38
Year:
1989
Language:
english
Pages:
4
DOI:
10.1016/0168-583x(89)90194-8
File:
PDF, 317 KB
english, 1989