Wafer chargeup study on the PR-80 high current ion...

Wafer chargeup study on the PR-80 high current ion implantation machine

N. Nagai, T. Kawai, M. Naito, Y. Nishigami, H. Fujisawa, K. Nishikawa
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Volume:
37-38
Year:
1989
Language:
english
Pages:
4
DOI:
10.1016/0168-583x(89)90249-8
File:
PDF, 327 KB
english, 1989
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