Ta2O5 film formation by double ion beam method

Ta2O5 film formation by double ion beam method

Teruhito Ohnishi, Yoshikazu Yoshida, Yuichi Hirofuji, Hiroshi Iwasaki
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Volume:
37-38
Year:
1989
Language:
english
Pages:
4
DOI:
10.1016/0168-583x(89)90312-1
File:
PDF, 327 KB
english, 1989
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