Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
1990 Vol. 46; Iss. 1-4
Oxygen depth profiling study of copper oxide films on silicon (100) substrates by 16O(α,α)16O resonance
Li Jian, L.J. Matienzo, P. Revesz, Gy. Vizkelethy, S.Q. Wang, J.J. Kaufman, J.W. MayerVolume:
46
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0168-583x(90)90714-6
File:
PDF, 405 KB
english, 1990