Oxygen depth profiling study of copper oxide films on...

Oxygen depth profiling study of copper oxide films on silicon (100) substrates by 16O(α,α)16O resonance

Li Jian, L.J. Matienzo, P. Revesz, Gy. Vizkelethy, S.Q. Wang, J.J. Kaufman, J.W. Mayer
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Volume:
46
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0168-583x(90)90714-6
File:
PDF, 405 KB
english, 1990
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