Reduction of secondary defect formation in MeV As ion...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 1991 Vol. 59-60; Iss. part-P1

Reduction of secondary defect formation in MeV As ion implanted Si(100)

R.J. Schreutelkamp, W.X. Lu, J.R. Liefting, V. Raineri, J.S. Custer, F.W. Saris
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Volume:
59-60
Year:
1991
Language:
english
Pages:
5
DOI:
10.1016/0168-583x(91)95288-o
File:
PDF, 559 KB
english, 1991
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