Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
1991 Vol. 58; Iss. 2
Improved dose uniformity by utilizing the beam profile in the ion implantation process
R. GuenzelVolume:
58
Year:
1991
Language:
english
Pages:
2
DOI:
10.1016/0168-583x(91)95606-e
File:
PDF, 202 KB
english, 1991