Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
1991 Vol. 59-60; Iss. part-P2
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Secondary defect reduction by channeling implantation of B and P in 〈100〉 silicon
V. Raineri, R.J. Schreutelkamp, F.W. Saris, R.E. Kaim, K.T.F. JanssenVolume:
59-60
Year:
1991
Language:
english
Pages:
5
DOI:
10.1016/0168-583x(91)95764-5
File:
PDF, 496 KB
english, 1991