Channeling effect of P implantation in Si(100)

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 1991 Vol. 59-60; Iss. part-P2

Channeling effect of P implantation in Si(100)

Yu Ning, Chu Wei-Kan, Bijoy Patnaik, Nalin Parikh, Sean Corcoran, Charles Kirschbaum, Kody Varahramyan
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Volume:
59-60
Year:
1991
Language:
english
Pages:
6
DOI:
10.1016/0168-583x(91)95765-6
File:
PDF, 533 KB
english, 1991
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