Sublimation and diffusion of arsenic implanted into silicon...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 1991 Vol. 55; Iss. 1-4

Sublimation and diffusion of arsenic implanted into silicon at rapid electron beam annealing

R. Grötzschel, V.A. Kagadey, N.I. Lebedeva, D.I. Proskurovsky
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Volume:
55
Year:
1991
Language:
english
Pages:
3
DOI:
10.1016/0168-583x(91)96233-b
File:
PDF, 281 KB
english, 1991
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