Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
1992 Vol. 64; Iss. 1-4
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O2+ and Xe+ depth profiling of 150 keV Cs+ implantation in Si and SiO2 by SIMS
M.K. Bhan, J.A. KilnerVolume:
64
Year:
1992
Language:
english
Pages:
5
DOI:
10.1016/0168-583x(92)95549-7
File:
PDF, 436 KB
english, 1992