Concentration profiles of high dose MeV oxygen implanted...

Concentration profiles of high dose MeV oxygen implanted silicon

K. Touhouche, J. Jackman, A. Yelon
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Volume:
80-81
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0168-583x(93)90697-5
File:
PDF, 347 KB
english, 1993
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