Roles of implantation temperature and ion dose rate in...

Roles of implantation temperature and ion dose rate in ion-beam synthesis of buried Si3N3 layers

G.A. Kachurin, V.D. Akhmetov, I.E. Tyschenko, A.E. Plotnikov
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Volume:
74
Year:
1993
Language:
english
Pages:
6
DOI:
10.1016/0168-583x(93)95971-7
File:
PDF, 1.15 MB
english, 1993
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