Dynamics of void formation during implantation of Si under...

Dynamics of void formation during implantation of Si under self-annealing conditions and their influence on dopant distribution

G. Lullu, P.G. Merli, A. Migliori, G. Brusatin, A.V. Drigo
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Volume:
80-81
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0168-583x(93)96181-b
File:
PDF, 361 KB
english, 1993
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