Diffusion study of Kr, Rb and Xe implanted into positive...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 1996 Vol. 111; Iss. 1-2

Diffusion study of Kr, Rb and Xe implanted into positive and negative photoresist films

J.R. Kaschny, M. Behar
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Volume:
111
Year:
1996
Language:
english
Pages:
8
DOI:
10.1016/0168-583x(95)01272-9
File:
PDF, 863 KB
english, 1996
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