Ion versus neutral irradiation of thin films of amorphous...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 1996 Vol. 116; Iss. 1-4

Ion versus neutral irradiation of thin films of amorphous SiO2: an in situ X-ray photoelectron spectroscopy study

Alberto Torrisi, Antonino Licciardello, Valentina Ancarani, Massimiliano Cantiano, Orazio Puglisi
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Volume:
116
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/0168-583x(96)00069-9
File:
PDF, 487 KB
english, 1996
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