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Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processes
L. Hiltunen, H. Kattelus, M. Leskelä, M. Mäkelä, L. Niinistö, E. Nykänen, P. Soininen, M. TiittadVolume:
28
Year:
1991
Language:
english
Pages:
10
DOI:
10.1016/0254-0584(91)90073-4
File:
PDF, 666 KB
english, 1991