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Plasma oxidation of Cu, Ti and Ni and the photoelectrochemical properties of the oxide layers formed
Masayoshi Masui, Tetsuo Muranoi, Ryoichi Urao, Yoshihiro Momose, Mohammed Rafiqul Islam, Manabu TakeuchiVolume:
43
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0254-0584(95)01631-4
File:
PDF, 382 KB
english, 1996