Determination of the heavy-metal ion-dose after implantation in silicon-wafers by total reflection X-ray fluorescence analysis
R. Klockenkämper, M. Becker, H. BubertVolume:
46
Year:
1991
Language:
english
Pages:
5
DOI:
10.1016/0584-8547(91)80187-8
File:
PDF, 386 KB
english, 1991