The electrical properties of dielectric stacks of SiO2 and...

Current Applied Physics 2012 Vol. 12; Iss. 2

The electrical properties of dielectric stacks of SiO2 and Al2O3 prepared by atomic layer deposition method

Byeol Han, Seung-Won Lee, Kwangchol Park, Chong-Ook Park, Sa-Kyun Rha, Won-Jun Lee
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Volume:
12
Year:
2012
Language:
english
Pages:
3
DOI:
10.1016/j.cap.2011.07.045
File:
PDF, 338 KB
english, 2012
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