Submicrometer thickness layer fabrication for...

Submicrometer thickness layer fabrication for layer-by-layer microstereolithography using evanescent light

S. Takahashi, Y. Kajihara, K. Takamasu
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Volume:
61
Year:
2012
Language:
english
Pages:
1
DOI:
10.1016/j.cirp.2012.03.069
File:
PDF, 873 KB
english, 2012
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