Role of polycation adsorption in poly-Si, SiO2 and Si3N4...

Role of polycation adsorption in poly-Si, SiO2 and Si3N4 removal during chemical mechanical polishing: Effect of polishing pad surface chemistry

Naresh K. Penta, John B. Matovu, P.R. Dandu Veera, Sitaraman Krishnan, S.V. Babu
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
388
Year:
2011
Language:
english
Pages:
8
DOI:
10.1016/j.colsurfa.2011.07.039
File:
PDF, 705 KB
english, 2011
Conversion to is in progress
Conversion to is failed