Role of polycation adsorption in poly-Si, SiO2 and Si3N4 removal during chemical mechanical polishing: Effect of polishing pad surface chemistry
Naresh K. Penta, John B. Matovu, P.R. Dandu Veera, Sitaraman Krishnan, S.V. BabuVolume:
388
Year:
2011
Language:
english
Pages:
8
DOI:
10.1016/j.colsurfa.2011.07.039
File:
PDF, 705 KB
english, 2011