Negative ion formation through dissociative electron...

International Journal of Mass Spectrometry 2011 Vol. 306; Iss. 1

Negative ion formation through dissociative electron attachment to GeH4: Comparative studies with CH4 and SiH4

M. Hoshino, Š. Matejčík, Y. Nunes, F. Ferreira da Silva, P. Limão-Vieira, H. Tanaka
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Volume:
306
Year:
2011
Language:
english
Pages:
6
DOI:
10.1016/j.ijms.2011.06.009
File:
PDF, 403 KB
english, 2011
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