The behaviour of Ti-substrates during deposition of boron...

International Journal of Refractory Metals and Hard Materials 2008 Vol. 26; Iss. 5

The behaviour of Ti-substrates during deposition of boron doped diamond

Isabella Gerger, Roland Haubner
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Volume:
26
Year:
2008
Language:
english
Pages:
6
DOI:
10.1016/j.ijrmhm.2007.10.002
File:
PDF, 2.25 MB
english, 2008
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