High temperature dissolution of oxides in complexing media

Journal of Nuclear Materials 2011 Vol. 419; Iss. 1-3

High temperature dissolution of oxides in complexing media

Valil S. Sathyaseelan, Appadurai L. Rufus, Hariharan Subramanian, Anupkumar Bhaskarapillai, Shiny Wilson, Sevilimedu V. Narasimhan, Sankaralingam Velmurugan
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Volume:
419
Year:
2011
Language:
english
Pages:
7
DOI:
10.1016/j.jnucmat.2011.08.034
File:
PDF, 552 KB
english, 2011
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