Formation of interface silicides at room temperature in pulsed laser deposited Ti thin films on Si〈1 0 0〉
V. Venkataraman, S. Rajagopalan, P. Manoravi, A.K. Balamurugan, A. Ramalingam, A.K. TyagiVolume:
38
Year:
2003
Language:
english
Pages:
6
DOI:
10.1016/j.materresbull.2003.08.002
File:
PDF, 162 KB
english, 2003