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Chemical vapor deposition of silicon nitride thin films from tris(diethylamino)chlorosilane
Xuejian Liu, Xipeng Pu, Huili Li, Fagui Qiu, Liping HuangVolume:
59
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.matlet.2004.05.058
File:
PDF, 117 KB
english, 2005